Sample Fabrication
Substrate
n-Si(100), ρ = 1-10 Ω-cm
Implantation conditions
Au, 50 keV, 5e14 /cm2 dose
Pulsed laser melting
Spot |
Spot size |
Laser used |
Shooting conditions |
Result |
---|---|---|---|---|
A |
2.5x2.5 mm2, masked |
Harvard YAG, 355 nm |
1 shot @ 0.7 J/cm2 |
good |
B |
2.5x2.5 mm2, masked |
Harvard YAG, 355 nm |
1 shot @ 0.7 J/cm2 |
dirty spot, bad TRR |
C |
2.5x2.5 mm2, masked |
Harvard YAG, 355 nm |
1 shot @ 0.7 J/cm2 |
good |
D |
2.5x2.5 mm2, masked |
Harvard YAG, 355 nm |
1 shot @ 0.7 J/cm2 |
good |
E |
2.5x2.5 mm2, masked |
Harvard YAG, 355 nm |
1 shot @ 0.7 J/cm2 |
good |
Measurements and Processing
Sample 2A
- 6/4/2012 UV-VIS reflection measurement on crystalline and amorphous spot
20120604 UV-VIS reflection Au 2a.Sample.Raw.csv
20120604 UV-VIS reflection Au 2a amorphous.Sample.Raw.csv
- 6/5/2012 UV-VIS transmission measurement on crystalline and amorphous spot
20120605 UV-VIS transmission Au 2a.Sample.Raw.csv
20120605 UV-VIS transmission Au 2a amorphous.Sample.Raw.csv
Sample 2B
- 6/13/2012 FIB-cut TEM sample from clean, uniform-looking area. Bottom (relative to shooting maps) 100 um of spot is now gallium-irradiated.
AuSi2b_ThinnedTEM.tif
- 6/14/2012 SEM and EBSD. No evidence of breakdown or faulting. EBSD shows good (100) oriented single-crystal throughout.
Spot 2b tilt 2.tif
Spot 2b 90kx.tif
Spot 2b 300kx.tif
Spot 2b failed fib crater.tif