Sample Fabrication
Substrate
n-Si(100), ρ = ? Ω-cm
Implantation conditions
Au, 50 keV, 1e15 /cm2 dose
Pulsed laser melting
Spot | Spot size | Laser used | Shooting conditions | Result |
|---|---|---|---|---|
A | 2.5x2.5 mm2, masked | Benet YAG, 355 nm | 1 shot @ 0.65 J/cm2 |
|
B | 2.5x2.5 mm2, masked | Benet YAG, 355 nm | 1 shot @ 0.65 J/cm2 |
|
Measurements and processing
Sample 5A
- 8/21/2012 SEM, non-uniform and very messy surface but no sign of breakdown.
AuSi Jeff YAG 1e15 Spot a 67 kx.tif
AuSi Jeff YAG 1e15 Spot a 182kx.tif
AuSi Jeff YAG 1e15 Spot a 460kx.tif
Sample 5B
- 8/21/2012 SEM, non-uniform surface but no sign of breakdown.
AuSi Jeff YAG 1e15 Spot b 475 kx.tif
AuSi Jeff YAG 1e15 Spot b 103 kx.tif
AuSi Jeff YAG 1e15 Spot b 335 x 2.tif
AuSi Jeff YAG 1e15 Spot b 335 x.tif