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  • 6/13/2012          Spin photoresist and bake at 115 C for 1 minute to protect sample from debris during laser cut
  • 6/16/2012          Remove resist
Sample 3B
  • 6/13/2012          Spin photoresist and bake at 115 C for 1 minute to protect sample from debris during laser cut
  • 6/16/2012          Remove resist
Sample 3C
  • 6/13/2012          Spin photoresist and bake at 115 C for 1 minute to protect sample from debris during laser cut
  • 6/16/2012          Remove resist
Sample 3D